CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION

摘要

PURPOSE: A chemical amplification type positive resist composition is provided, which can be applied to the lithography using an excimer laser such as ArF or KrF, shows excellent performance balance of resolution and sensitivity and ensures small reduction in size in SEM observation. CONSTITUTION: The chemical amplification type positive resist composition comprises 80-99.9 wt% of a resin which has a repeating unit derived from the unsaturated monomer represented by the formula 1, and is alkali-soluble by the action of an acid even though it is alkali-insoluble; and 0.1-20 wt% of an acid generator, wherein R1 and R2 are independent each other and H or a methyl group. Optionally the chemical amplification positive resist composition comprises further 0.001-0.1 parts by weight of a basic compound as a quencher based on 100 parts by weight of the resin.