发明名称 Wafer sidewall inspection system and method
摘要 An inspection system and method for inspecting a sidewall of a wafer to detect a wafer having a sidewall defect. The inspection system includes, a wafer revolver driven by a driving source for rotating the wafer, an image capturing unit for capturing image information of the sidewall of the wafer rotating by the wafer revolver, and an analyzer comparing captured image data to image data of a desired wafer sidewall and determining whether the inspected wafer is acceptable in accordance with the comparison. The image capturing unit may include an illuminator for illuminating the sidewall of the wafer rotated by the wafer revolver and a detector for capturing image data for the sidewall of the wafer illuminated by the illuminator.
申请公布号 US6449585(B1) 申请公布日期 2002.09.10
申请号 US19990320140 申请日期 1999.05.26
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HYUN KI-CHUL;KEUM GYEONG-SU
分类号 H01L21/66;G06F11/30;H01L21/00;(IPC1-7):G06F11/30 主分类号 H01L21/66
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