发明名称 SYSTEM AND METHOD FOR CHARGED PARTICLE BEAM
摘要 PROBLEM TO BE SOLVED: To provide a system having improved throughput by reducing the time for waiting the stabilization of a sample size caused by cooling of atmosphere gas, due to adiabatic expansion in a load lock chamber. SOLUTION: The temperature of a treatment chamber is set lower than the ambient temperature of charged particle beams, corresponding to the sample temperature to be carried. As a result, treatment can be started, immediately after carrying the sample into the treatment chamber, and thereby throughput is improved.
申请公布号 JP2002252155(A) 申请公布日期 2002.09.06
申请号 JP20010046001 申请日期 2001.02.22
申请人 NIKON CORP 发明人 MORITA KENJI
分类号 G03F7/20;B65G49/00;H01J37/20;H01J37/305;H01L21/027;H01L21/677;H01L21/68;(IPC1-7):H01L21/027 主分类号 G03F7/20
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