发明名称 A PROCESS FOR ELECTROCHEMICAL DEPOSITION OF TANTALUM AND AN ARTICLE HAVING A SURFACE MODIFICATION
摘要 <p>A process for electrochemical deposition of tantalum on an article in an inert, non-oxidizing atmosphere or under vacuum, in a molten electrolyte containing tantalum ions, comprising the steps of: immersing the article into the molten electrolyte heated to a working temperature, passing an electric current through the elctrolyte to thereby deposit a tantalum coating on the article, wherein the process of tantalum deposition at least in an intitial phase deposits pure α-tantalum.</p>
申请公布号 WO2002068729(A1) 申请公布日期 2002.09.06
申请号 DK2002000127 申请日期 2002.02.26
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