发明名称 |
METHOD FOR MANUFACTURING COMPOUND SEMICONDUCTOR SINGLE CRYSTAL AND UTILIZATION THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a method where a nitride semiconductor single crystal having a small dislocation density can be manufactured by a simple and easy way. SOLUTION: In the method for manufacturing a compound semiconductor single crystal, a compound semiconductor single crystal represented by a general formula, InxCayAlzN (wherein, x+y+z=1; 0<=x<=1; 0<=y<=1; 0<=z<=1), is selectively grown on a semiconductor silicon substrate equipped with a mask having a through-hole with a circle conversion diameter of <=1 μm. |
申请公布号 |
JP2002249400(A) |
申请公布日期 |
2002.09.06 |
申请号 |
JP20010046837 |
申请日期 |
2001.02.22 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
SAWAKI NOBUHIKO;YAMAGUCHI MASAFUMI;HONDA YOSHIO |
分类号 |
C30B29/38;H01L21/205;H01L33/16;H01L33/32;H01L33/34;H01S5/323;H01S5/343 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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