发明名称 METHOD FOR MANUFACTURING COMPOUND SEMICONDUCTOR SINGLE CRYSTAL AND UTILIZATION THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a method where a nitride semiconductor single crystal having a small dislocation density can be manufactured by a simple and easy way. SOLUTION: In the method for manufacturing a compound semiconductor single crystal, a compound semiconductor single crystal represented by a general formula, InxCayAlzN (wherein, x+y+z=1; 0<=x<=1; 0<=y<=1; 0<=z<=1), is selectively grown on a semiconductor silicon substrate equipped with a mask having a through-hole with a circle conversion diameter of <=1 &mu;m.
申请公布号 JP2002249400(A) 申请公布日期 2002.09.06
申请号 JP20010046837 申请日期 2001.02.22
申请人 MITSUBISHI CHEMICALS CORP 发明人 SAWAKI NOBUHIKO;YAMAGUCHI MASAFUMI;HONDA YOSHIO
分类号 C30B29/38;H01L21/205;H01L33/16;H01L33/32;H01L33/34;H01S5/323;H01S5/343 主分类号 C30B29/38
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