| 摘要 |
PROBLEM TO BE SOLVED: To reduce stoppage time, corresponding to filter exchange of cleaning equipment by properly grasping the exchange time of a filter and prolonging replacement period, regarding the cleaning equipment in which, e.g. a semiconductor wafer is cleaned by using a chemical liquid. SOLUTION: In the cleaning equipment A, cleaning liquid is circulated to a cleaning tank by using a circulation line having the filter, and an object is cleaned. In the circulation line, a main circulation line and an auxiliary circulation line are arranged, and a control device for switching the flow of the cleaning liquid between the main circulation line and the auxiliary circulation line is installed.
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