| 发明名称 |
Photomask |
| 摘要 |
A photomask is produced which enables the simplification of the steps of lithography. A photomask is provided with shielding patterns made of shielding metallic thin film on a transparent substrate, wherein the photomask further comprises translucent patterns mainly including tantalum of materials selected from tantalum silicide, tantalum oxide, tantalum nitride or mixture thereof. |
| 申请公布号 |
US2002119379(A1) |
申请公布日期 |
2002.08.29 |
| 申请号 |
US20010023841 |
申请日期 |
2001.12.21 |
| 申请人 |
NOGUCHI KENJI;MOTONAGA TOSHIAKI;NAKAGAWA HIRO-O;MORIKAWA YASUTAKA;YOKOYAMA TOSHIFUMI;TOMINAGA TAKASHI;KINASE YOSHINORI;FUJIKAWA JUNJI;TAKAHASHI YOICHI |
发明人 |
NOGUCHI KENJI;MOTONAGA TOSHIAKI;NAKAGAWA HIRO-O;MORIKAWA YASUTAKA;YOKOYAMA TOSHIFUMI;TOMINAGA TAKASHI;KINASE YOSHINORI;FUJIKAWA JUNJI;TAKAHASHI YOICHI |
| 分类号 |
G03F1/08;G02F1/13;G03F1/14;G03F1/54;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/08 |
| 代理机构 |
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