发明名称 COLLOIDAL SILICA FILMS FOR CELL CULTURE
摘要 <p>Methods for producing thin colloidal silica films on substrates, such as corona treated polystyrene, are provided. The dried films are characterized as 50 nm thick, high silanol, homogenous, high surface area, porous, uncracked, adherent, wetting, negatively charged, and gamma radiation stable. Several differential advantages of the colloidal silica films were demonstrated in epithelial cell culture, especially regarding primary cultures in serum free media. Cell responses to the films were increased explant adhesion, increased cell growth rate, and increased expression of differentiated function before and after subculture as compared to tissue culture polystyrene.</p>
申请公布号 EP0853664(A4) 申请公布日期 2002.08.28
申请号 EP19960937653 申请日期 1996.10.02
申请人 CORNING INCORPORATED 发明人 WOLCOTT, CHRISTINE, C.
分类号 C12M1/00;B32B9/00;C12N5/00;C12N5/071;C12N11/08;C12N11/14;(IPC1-7):C12N11/14;B01J31/00;B01J21/04;B32B5/16;C12M1/40 主分类号 C12M1/00
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