发明名称 |
Planarization method and system using variable exposure |
摘要 |
A method and system for planarization is disclosed. The system includes a mask including a medium density, sub-resolution region which allows less than the full intensity of the exposing radiation through to a resist layer. By including multiple density regions, improved planarization can be achieved. |
申请公布号 |
US6440644(B1) |
申请公布日期 |
2002.08.27 |
申请号 |
US19990438061 |
申请日期 |
1999.11.10 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
SATO TAKASHI;OKUMURA KATSUYA;IBA JUNICHIRO |
分类号 |
G03C5/00;(IPC1-7):G03C5/00 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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