LIMIT-ULTRAVIOLET LITHOGRAPHY APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a limit-ultraviolet lithography apparatus for reducing the corrosion effect of ion sputtering. SOLUTION: The limit-ultraviolet lithography apparatus utilizes a thin-film protection coating (46) for protecting a plurality of hardware elements that are positioned near a laser generation light source (32) from the corrosion effect of energy particles emitted from a laser generation light source.