| 摘要 |
Methods are disclosed for dividing a pattern in a segmented reticle such as used in charged-particle-beam microlithography. In the methods, the reticle pattern is divided among multiple subfields delineated by respective initial subfield-boundary lines. In an exemplary embodiment, initial subfield-boundary lines are determined by determining respective extensions of pattern elements in each of the X and Y directions. For example, if the extension in the Y direction is longer than in the X direction, then an initial pattern division (including into complementary subfields as required) is made using the initial subfield-boundary extending in the X direction. If the pattern exhibits a period repeat in the Y direction, then the initial subfield-boundary lines are established at an integer multiple of half the period repeat. The initial subfield-boundary lines are then corrected by shifting the initial subfield-boundary lines as required such that the subfield-boundary lines extend through nearby "significant points" (bend points meeting certain predetermined criteria) of adjacent pattern elements. |
