Process for lacquering photomask blank, used for chip manufacture, involves neutralizing chromium oxide-coated mask with dilute acid in deionized water, cleaning and applying chemically amplified resist

摘要

Process for lacquering a photomask blank for chip manufacture comprises: (a) preparing a mask blank coated with a chromium oxide CrOx; (b) treatment with a dilute acid aqueous solution to neutralize basic impurities on the blank; (c) cleaning the blank; and (d) applying a chemically amplified resist. An independent claim is also included for photomasks for chip manufacture made from a CrOx-coated substrate, coated with a chemically amplified resist as above.