| 摘要 |
PURPOSE: To provide an active matrix type liquid crystal display of reflection type of which a reflection film is formed surely, exposure quantity for forming the reflection film is small, manufacture time can be shortened, manufacturing process is simple and sufficient storage capacity can be secured for each pixel. CONSTITUTION: An upper electrode 59 which is arranged between a first insulating layer 60 and a lower insulating film 56, is electrically connected with a source electrode of a thin-film transistor and also is electrically connected with a reflecting film 51 and a lower electrode 58, which is arranged between a glass substrate 55 and the lower insulating film 56 and forms stored capacity, together with the upper electrode 59, are provided in a rugged structure forming the region of each pixel. Based on a form of the first insulating layer 61 subjected to a patterning process, rugged form on the surface of the reflecting film 51 is determined. When the first insulating layer 61 is subjected to patterning through photolithography, the upper electrode 59 is made to function as a reflecting member.
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