| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for preventing particles from adhering on the surface of a substrate in a vertical line, when dipping the substrate in treatment liquid by supporting the substrate in an upright attitude by a substrate- supporting member. SOLUTION: When a lifter 56, supporting the substrate W in an upright posture, is lowered and the substrate W is dipped into a chemical 60 in a chemical treatment bath 12, the lifter is stopped temporarily; when the contact position of an area near the lower end of the substrate and the lifter is slightly dipped into the chemical liquid, while the lifter is being lowered; and a foreign object that has adhered to the lower end section of the lifter is diffused into the chemical, and then the lifter is further lowered, thus dipping the entire substrate into the chemical.
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