发明名称 VAPORIZATION OF PRECURSOR AT POINT OF USE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and a method for vaporizing and delivering liquid precursor to a processing chamber. SOLUTION: The apparatus is a liquid delivery system including a liquid supply 120, a vaporization assembly 130 which is fluidally coupled to the liquid supply and consists essentially of an ampoule 140 and a mass flow controller 150 connected with he ampoule, and the processing chamber 160 fluidally coupled to the vaporization assembly. The liquid precursor is vaporized in the ampoule. In a preferred embodiment, the ampoule is located adjacent to the processing chamber to provide a point of use vaporization of the liquid precursor. In another mode, the method includes a step for providing the liquid supply containing the liquid precursor, a step for delivering the liquid precursor to the ampoule, a step for vaporizing a portion of the liquid precursor in the ampoule, and a step for flowing the vaporized precursor to the processing chamber.
申请公布号 JP2002231709(A) 申请公布日期 2002.08.16
申请号 JP20010325249 申请日期 2001.10.23
申请人 APPLIED MATERIALS INC 发明人 HENDRICKSON SCOTT
分类号 B01J4/00;C23C16/448;H01J37/32;H01L21/205;H01L21/31;(IPC1-7):H01L21/31 主分类号 B01J4/00
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