发明名称 CLEANING EQUIPMENT OF DEPOSITION CHAMBER USING REMOTE PLASMA
摘要 PROBLEM TO BE SOLVED: To decrease plasma ignition electric power and improve durability of a constituent like an electrode while the whole body is made compact and cost is reduced, and enable proper cleaning inside a deposition chamber by effectively generating plasma. SOLUTION: In this cleaning equipment, reactive excitation species are introduced in the deposition chamber 2 from a remote high frequency discharge tube 1 in which plasma is generated by applying high frequency power, precursor gas is activated and the reactive excitation species can be generated. The remote high frequency discharge tube 1 is constituted of an insulating tubular vessel 5 and an inductive coupling type electrode 7 for high frequency discharge which is wound around the vessel 5 in a spiral coil form. The electrode 7 is constituted of a large diameter conductive metal tube 8 which is wound in a coil form in the state that cooling water can be made to flow inside, and a small diameter high frequency power line 9 which is arranged between spiral pitches of the metal tube 8 and wound in a coil form.
申请公布号 JP2002231711(A) 申请公布日期 2002.08.16
申请号 JP20010028209 申请日期 2001.02.05
申请人 PEARL KOGYO KK 发明人 NODA KAZUTOSHI;SONODA HIROAKI;MASUI YOSHIHIRO;SAEKI NOBORU
分类号 C23C16/44;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/31;H01L21/306 主分类号 C23C16/44
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