APPARATUS FOR LASER ANNEALING

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for laser annealing capable of generating a semiconductor film having proper characteristics. SOLUTION: The apparatus for laser annealing comprises a laser optical system, having a laser oscillator for outputting a laser beam inserted of a conventional laser annealing apparatus, capable of activating or crystallizing a semiconductor film of a substrate by irradiating a laser beam, and a substrate support structure for supporting the substrate. An intersection angle between the optical axis of the beam on the irradiation surface of the substrate and irradiation surface orthogonal axis of the substrate is turned to become a prescribed valueδ.