| 摘要 |
PURPOSE:To generate a transverse mode pattern adapted to thermal processing without lowering the output, by stopping down the focus of the laser by the concave reflective mirror between the laser transmitter and the reflective mirror and by irradiating the laser to the reflective mirror by the convex reflective mirror, in the laser processing device using the reflective mirror. CONSTITUTION:In the device where the laser beam from transmitter 1 is irradiated to material 11 to be processed through reflective mirror 9 and laser head 10, concave reflective mirror 15 and convex reflective mirror 16 are provided between transmitter 1 and reflective mirror 9, and laser beam 8 is made into parallel beam 17 where the beam diameter D is stopped down to (d) (D>d), and this parallel beam 17 is guided to laser head 10 through reflective mirror 9, which is installed in such sufficient distance that Fraunhofer's diffraction may be caused, and is irradiated to material 11 to be processed. Thus, a transverse mode pattern adapted to thermal processing can be generated without lowering the laser output by generating the long visual field pattern of the laser beam. |
