Method and apparatus for plasma processing of surfaces

摘要

Process for treating a surface of a workpiece (8) comprises subjecting the workpiece to ions and electrons in an intermediate chamber (10) between a first (4) and a further plasma electrode (5). An alternating electrical field is produced between the electrodes and the workpiece and the alternating fields of the electrodes stand together in fixed phase ratio. An Independent claim is also included for a device for treating the surface of a workpiece comprising a vacuum chamber (1) containing the plasma electrodes. Preferred Features: The fields have a frequency of 1 kHz and 350 MHz.