| 摘要 |
PURPOSE: A thin film deposition method is provided to supply an advanced thin film by improving step coverage and film formation characteristic and by reducing a manufacturing time. CONSTITUTION: A thin film deposition method comprises a first step(S2) deciding a thin film use, a second step(S3) deciding a thin film thickness and a third step(S4) deciding a repeating number of a first, a second and a third sub-step for forming the thin film having the thickness decided in the second step(S3). At this point, the first, second and third steps(S2,S3,S4) are pre-steps(S1). The thin film deposition method further includes a fourth step(S5) actually depositing the thin film according to the pre-steps(S1).
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