发明名称 |
PHOTOCURABLE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a photocurable resin composition wherein the synthesis of a resin is simple and convenient and the ink sensitivity and the tack property shown by step grading evaluation can be balanced. SOLUTION: The composition contains a monomer composition having a terminal carboxyl group in which a terminal hydroxy (meth)acrylate obtained by adding to hydroxyalkyl (meth)acrylate of 1 mol a ε-caprolactone monomer at a ratio of less than 1 mol is acid-anhydride-modified. Alternatively, it contains a monomer composition which has a terminal carboxyl group obtained by adding to a (meth)acrylic acid the monomer at the same ratio. |
申请公布号 |
JP2002220407(A) |
申请公布日期 |
2002.08.09 |
申请号 |
JP20010016231 |
申请日期 |
2001.01.24 |
申请人 |
DAICEL CHEM IND LTD |
发明人 |
MIYAKE HIROTO;MARUO KATSUYA |
分类号 |
G03F7/027;C08F2/46;C08F220/04;C08F220/26;C08G59/42 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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