发明名称 PHOTOCURABLE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photocurable resin composition wherein the synthesis of a resin is simple and convenient and the ink sensitivity and the tack property shown by step grading evaluation can be balanced. SOLUTION: The composition contains a monomer composition having a terminal carboxyl group in which a terminal hydroxy (meth)acrylate obtained by adding to hydroxyalkyl (meth)acrylate of 1 mol a ε-caprolactone monomer at a ratio of less than 1 mol is acid-anhydride-modified. Alternatively, it contains a monomer composition which has a terminal carboxyl group obtained by adding to a (meth)acrylic acid the monomer at the same ratio.
申请公布号 JP2002220407(A) 申请公布日期 2002.08.09
申请号 JP20010016231 申请日期 2001.01.24
申请人 DAICEL CHEM IND LTD 发明人 MIYAKE HIROTO;MARUO KATSUYA
分类号 G03F7/027;C08F2/46;C08F220/04;C08F220/26;C08G59/42 主分类号 G03F7/027
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