发明名称 METHOD AND DEVICE FOR ELECTRON BEAM IRRADIATION
摘要 <p>PROBLEM TO BE SOLVED: To provide a method and device for electron beam irradiation by which stable electron bream irradiation can be performed by effectively avoiding the scattering of an electron beam and, in addition, eliminating the need of a large-scale vacuum chamber. SOLUTION: A support 4 which supports an object 3 to be irradiate with the electron beam and a head section 6 having an electron beam emitting hole 5 at its front end are provided with a differential static pressure floating means 22. The floating beams 22 is floated from the object 3 by a desired prescribed clearance and, at the same time, constitutes a non-contact vacuum sealed section which limitedly forms a vacuum space in an electron beam passage section between the emitting hole 5 and the object 3. The electron beam passage is stabilized by constituting the passage of an extending and contracting mechanism which extends and contracts in the axial direction of a cylindrical wall section, and making the degree of vacuum in the passage to be able to be increased more by making the clearance between the vicinity of the emitting hole 5 and the object 3 accurately settable to a narrow clearance.</p>
申请公布号 JP2002222749(A) 申请公布日期 2002.08.09
申请号 JP20010014876 申请日期 2001.01.23
申请人 SONY CORP 发明人 AKI YUICHI;YAMAMOTO MASANOBU
分类号 G01N23/225;G03F7/20;G03F9/02;G11B7/26;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01N23/225
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