发明名称 Photosensitive resin composition, its use, lactone-ring-containing polymer, and production process therefor
摘要 The present invention provides: a photosensitive resin composition, which can form uniform coating films having higher coating film strength without causing surface contamination, decrease of evenness of coating films, decrease of film thickness, and coloring by decomposition in heat treatment of subsequent steps, and has good sensitivity of exposure. The photosensitive resin composition comprises a lactone-ring-containing polymer (A) as an essential component, wherein: the lactone-ring-containing polymer (A) is obtained by carrying out polymerization of comonomers and lactonization at the same time wherein the comonomers include a 2-(hydroxyalkyl)acrylate ester and an acidic-group-containing monomer; and the lactone-ring-containing polymer (A) is obtained by almost quantitatively carrying out lactonization of a 2-(hydroxyalkyl)acrylate ester structural unit.
申请公布号 US2002106568(A1) 申请公布日期 2002.08.08
申请号 US20010012083 申请日期 2001.12.02
申请人 NIPPON SHOKUBAI CO., LTD. 发明人 ASANO HIDEO;UEDA KENICHI;YAMAGUCHI MINORU;YOSHIDA MASATOSHI;KANEKO TONOMASA;KATAOKA SHINGO
分类号 C08F8/16;C08F220/14;C08F220/28;G02F1/1335;G03F7/00;G03F7/033;G03F7/038;(IPC1-7):G03F7/038;C08F8/14;C08F16/14;G02F1/133;G03F7/027 主分类号 C08F8/16
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