Plasma processing apparatus and method

摘要

A plasma processing apparatus having a process chamber to process specimens, further comprising a status detecting means for detecting the internal processing status of said process chamber and outputting a plurality of signals and signal converting means for extracting an arbitrary number of signal processing filters from a signal filter database by a signal filter selecting means and creating arbitrary number of device status signals; wherein said signal converting means create a fewer effective device status signals of a time series from said output signals.