发明名称 |
MAGNETIC POLE FABRICATION PROCESS AND DEVICE |
摘要 |
A method and apparatus for fabricating an electroplating mask for the formation of a miniature magnetic pole tip structure. The method incorporates a silylation process to silylate photoresist after creating a photoresist cavity or trench in the electroplating mask. The silylation process is performed after a dry etch of the photoresist. Alternatively, silylation is performed after a lithographic patterning of the trench. As a result of chemical biasing, the vertical side walls of the photoresist layer shift inward creating a narrower trench. The resulting structure formed after electroplating has a width of less than 0.3 micrometers. This structure can be used as a magnetic pole of a thin film head ("TFH") for a data storage device. |
申请公布号 |
EP1228528(A1) |
申请公布日期 |
2002.08.07 |
申请号 |
EP20000960016 |
申请日期 |
2000.09.08 |
申请人 |
UNAXIS USA INC. |
发明人 |
KOBRIN, BORIS;OSTAN, EDWARD |
分类号 |
B82Y25/00;B82Y40/00;C25D5/02;C25D7/12;G11B5/31;H01F41/30;(IPC1-7):H01L21/306 |
主分类号 |
B82Y25/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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