发明名称 |
Direct injection accelerator method and system |
摘要 |
An electron beam accelerator system includes a high power switching device coupled between the direct current voltage source and the pulse forming network. A pulse control circuit is connected to control the high power switching device to selectively allow a current to flow to the pulse forming network. A voltage difference between a cathode and an anode structure creates an electron beam flowing therebetween. A control grid drive circuit is operatively coupled to the pulse control circuit and the control grid, and is operable to apply a time-varying voltage to the control grid synchronized with the pulse control circuit. The control grid therefore effectively provides a load on the high voltage output of a step-up transformer that prevents overshoot in the transformer output, reducing the risk of dielectric breakdown and failure due to transient high voltages.
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申请公布号 |
US6429608(B1) |
申请公布日期 |
2002.08.06 |
申请号 |
US20010789313 |
申请日期 |
2001.02.20 |
申请人 |
MITEC INCORPORATED |
发明人 |
LYONS STAN V.;TREAS PAUL;KOENCK STEVEN E. |
分类号 |
H05H7/02;(IPC1-7):H05H9/00 |
主分类号 |
H05H7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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