| 摘要 |
PROBLEM TO BE SOLVED: To provide a laser annealer that can suppress the generation of ablation during annealing. SOLUTION: The time-varying waveform of an excimer laser beam has two or three pulses. An excimer laser beam is irradiated that has a waveform in which the area of a first pulse 45 that appears first occupies 55% or more of the total area of the pulse 45, a pulse 46, and a pulse 47. If the area of the first pulse 45 is less than 55% of the total area of the pulses 45, 46, and 47, the reaching temperature of the amorphous silicon melted by the excimer laser beam is lowered. The solidification time of the amorphous silicon varies. The amount of impurities deposited on the grain boundary increases and ablation is generated. The amorphous silicon on a glass substrate is annealed into polysilicon. The ablation generated during annealing can be suppressed.
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