发明名称 LASER ANNEALING METHOD AND ITS APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a laser annealing method and its apparatus capable of making an uniform beam irradiation. SOLUTION: A beam 41 from a laser source is rotated with a rotation means 42 at a predetermined angle even though there is an ununiform strength distribution in a beam pattern of the beam 41 from the laser source, thereby, only a beam having a Gaussian distribution can be formed in a linear sectional shape through an optical system 57 by avoiding a strong light-strength portion, therefore, an uniform beam irradiation can be carried out to a sample 50.</p>
申请公布号 JP2002217126(A) 申请公布日期 2002.08.02
申请号 JP20010005579 申请日期 2001.01.12
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD;SEMICONDUCTOR ENERGY LAB CO LTD 发明人 KAWAGUCHI NORIHITO;NISHIDA KENICHIRO;ISHII MIKITO;YAGI TAKETO;MASAKI MIYUKI;YOSHINOUCHI ATSUSHI;TANAKA KOICHIRO
分类号 A61B18/20;B23K26/06;B23K26/073;H01L21/268;H01S3/00;(IPC1-7):H01L21/268 主分类号 A61B18/20
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