发明名称 |
LASER ANNEALING METHOD AND ITS APPARATUS |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a laser annealing method and its apparatus capable of making an uniform beam irradiation. SOLUTION: A beam 41 from a laser source is rotated with a rotation means 42 at a predetermined angle even though there is an ununiform strength distribution in a beam pattern of the beam 41 from the laser source, thereby, only a beam having a Gaussian distribution can be formed in a linear sectional shape through an optical system 57 by avoiding a strong light-strength portion, therefore, an uniform beam irradiation can be carried out to a sample 50.</p> |
申请公布号 |
JP2002217126(A) |
申请公布日期 |
2002.08.02 |
申请号 |
JP20010005579 |
申请日期 |
2001.01.12 |
申请人 |
ISHIKAWAJIMA HARIMA HEAVY IND CO LTD;SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
KAWAGUCHI NORIHITO;NISHIDA KENICHIRO;ISHII MIKITO;YAGI TAKETO;MASAKI MIYUKI;YOSHINOUCHI ATSUSHI;TANAKA KOICHIRO |
分类号 |
A61B18/20;B23K26/06;B23K26/073;H01L21/268;H01S3/00;(IPC1-7):H01L21/268 |
主分类号 |
A61B18/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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