| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film EL element and its manufacturing method in which a highly displaying quality is obtained without yielding a high cost wherein problems that the reduction of light-emitting luminance, unevenness of the luminance and time-changes of the luminance of the thin film EL element occur are solved wherein a multi-layer dielectric layer is formed by solution coating and baking method using lead series dielectric materials. SOLUTION: This has a multi-layer structure wherein an electrode layer having patterns is formed on the electric insulating substrate, and further wherein the lead series dielectric layer and a non-lead series high dielectric constant dielectric layer are formed by repeating the solution coating and baking method for plural times and laminated as the dielectric layer, and the foremost front layer of the dielectric layer of the multi-layer structure is made to be the non- lead series high dielectric constant dielectric layer.
|
