| 摘要 |
<p>The current Id flowing through a line of a DC high-voltage power supply (HV) when a high-frequency power supply (RF) is turned on and integrated so as to determine the change of charge ΔQ. The voltage Vdc of the wafer (W) is determined from the change of charge ΔQ. Thus, the potential of a work in a plasma is accurately determined with a simple structure.</p> |
