发明名称 3-dimensional imprint tool
摘要 The invention is a method for the fabrication of an imprint tool master. The process begins with a metallic substrate. A layer of photoresist is placed onto the metallic substrate and a image pattern mask is then aligned to the mask. The mask pattern has opaque portions that block exposure light and "open" or transparent portions which transmit exposure light. The photoresist layer is then exposed to light transmitted through the "open" portions of the first image pattern mask and the mask is then removed. A second layer of photoresist then can be placed onto the first photoresist layer and a second image pattern mask may be placed on the second layer of photoresist. The second layer of photoresist is exposed to light, as before, and the second mask removed. The photoresist layers are developed simultaneously to produce a multi-level master mandrel upon which a conductive film is formed. A tool master can now be formed onto the conductive film. An imprint tool is then produced from the tool master. In one embodiment, nickel is electroplated onto the tool master to produce a three-dimensional imprint tool.
申请公布号 US2002100691(A1) 申请公布日期 2002.08.01
申请号 US20020074212 申请日期 2002.02.12
申请人 BONIVERT WILLIAM D.;HACHMAN JOHN T. 发明人 BONIVERT WILLIAM D.;HACHMAN JOHN T.
分类号 B41C3/00;B41N1/06;C25D1/10;G03F7/00;H05K3/00;(IPC1-7):C25D1/10;C25D5/02;B32B7/02;B32B1/00 主分类号 B41C3/00
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