Testing exposure mask involves transferring layout pattern to mask if structure density below threshold, checking mask for fault-free transfer, checking limited area if threshold exceeded

摘要

The method involves producing a layout pattern from a circuit design, determining the structural density in the pattern and, if it does not exceed a threshold value, transferring the pattern to the mask and checking for fault-free transfer of the pattern. If the threshold is exceeded in at least one area the area is indicated, the pattern is transferred after user release and the mask checked for faultless transfer up the indicated area(s).