发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 A semiconductor device having a complementary logic gate including a field effect transistor (101) with a first conductivity type channel, a first conductivity type well region (202) formed in a semiconductor substrate (102), a second conductivity type channel layer (203) formed in its skin layer, a first wiring (112) connecting one end (204) of the second conductivity type channel layer (203) to a first conductivity type drain region (106), a second wiring (208) connecting the other end (205) of the second conductivity type channel layer (203) to a first power source, and a third wiring (208) connecting the well region (202) to a second power source having the same polarity as ht of the first power source, wherein a threshold voltage is easy to control at a low power consumption to avoid an increase in the number of manufacturing steps.
申请公布号 WO02059972(A1) 申请公布日期 2002.08.01
申请号 WO2002JP00249 申请日期 2002.01.16
申请人 SONY CORPORATION;IMOTO, TSUTOMU 发明人 IMOTO, TSUTOMU
分类号 H01L27/06;H01L21/337;H01L21/8232;H01L21/8238;H01L27/092;H01L29/808;(IPC1-7):H01L27/098 主分类号 H01L27/06
代理机构 代理人
主权项
地址