发明名称 LASER PLASMA EUV LIGHT SOURCE DEVICE, AND TARGET USED FOR IT
摘要 PROBLEM TO BE SOLVED: To repeatedly generate electromagnetic waves with a wave length in an EUV region by irradiation of laser beams at a high frequency higher than several kHz. SOLUTION: This light source device comprises a vacuum vessel 1, a tape-like target 33 disposed in the vacuum vessel 1, a beam irradiation means for irradiation of an energy beam to the target 33, an input optical system 2 for guiding the energy beam to the target 33, an output optical system 5 for guiding generated electromagnetic waves, a shielding device 4 for protecting at least one of the input optical system 2 and the output optical system 5 from debris, and a wave length selecting device 53 for selecting electromagnetic waves with the wave length in the EUV region from the generated electromagnetic waves. The target 33 has a two-layer structure of a polymer film and a metal layer to suppress occurrence of the debris, and occurring debris is also shielded by the shielding device 4. A winding thickness of the target 33 can be decreased, so that long time supply is allowed and the device can be also miniaturized.
申请公布号 JP2002214400(A) 申请公布日期 2002.07.31
申请号 JP20010004756 申请日期 2001.01.12
申请人 TOYOTA MACS INC;TOYOTA CENTRAL RES & DEV LAB INC 发明人 NISHIMURA YASUHIKO;AZUMA HIROZUMI
分类号 G21K5/08;G03F7/20;G21K5/00;H01L21/027;H05G2/00;H05H1/24 主分类号 G21K5/08
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