发明名称 REVOLUTION FOCUSING TYPE ELECTRON BEAM IRRADIATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam irradiation device allowing increase of treating efficiency by increasing hit probability to an irradiated body of an electron beam when the electron beam is applied to the extremely thin irradiated body to cure a resin applied to the surface. SOLUTION: Electrons released from a negative electrode disposed in a vacuum region kept in a high vacuum state are accelerated between it and a positive electrode having an electron passing hole, and transmitted through an electron transmission window for taking them out of the vacuum region, and then the transmitted electrons are revolved around the irradiated body while decreasing revolution trajectory radius. Thus, many electrons are collided to the irradiated body. The electron density through the electron beam transmission window is decreased to prevent overheat of the electron beam transmission window to improve reliability.
申请公布号 JP2002214399(A) 申请公布日期 2002.07.31
申请号 JP20010007684 申请日期 2001.01.16
申请人 ONO KATSUHIRO 发明人 ONO KATSUHIRO
分类号 G21K5/04;G21K5/00;G21K5/10;(IPC1-7):G21K5/04 主分类号 G21K5/04
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