发明名称 |
METHOD OF PRODUCING CERIUM OXIDE POLISHING MATERIAL AND CERIUM OXIDE POLISHING MATERIAL PRODUCED BY THE METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide the technology that can efficiently produce cerium oxide polishing material with markedly reduced content of coarse grains causing polishing flaws and provide a cerium oxide polishing material that can polish glass surfaces with polishing flaws reduced extremely. SOLUTION: The raw material of the rare earth mixture including cerium is finely crushed to prepare a raw material for polishing material. The material is fired, cracked and classified to produce the objective cerium polishing material wherein the rare earth mixture is pulverized until the content of the coarse grains with the particle size of >=10μm is reduced to <=500 ppm in the resultant polishing material.
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申请公布号 |
JP2002212544(A) |
申请公布日期 |
2002.07.31 |
申请号 |
JP20010005161 |
申请日期 |
2001.01.12 |
申请人 |
MITSUI MINING & SMELTING CO LTD |
发明人 |
UCHINO YOSHIJI;YAMAZAKI HIDEHIKO |
分类号 |
B02C17/00;B02C17/20;C01F17/00;C09K3/14;(IPC1-7):C09K3/14 |
主分类号 |
B02C17/00 |
代理机构 |
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主权项 |
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地址 |
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