发明名称 Method and laser system for production of high quality single-layer laser-induced damage portraits inside transparent material
摘要 Embodiments of methods and systems for producing high quality single-layer laser-induced damage portraits inside a transparent material are disclosed. One or more embodiments of the invention comprise a method and a system for production of an etch point without focal area expansion connected with the focused beam refraction. One or more embodiments of the invention comprise a method and a system for producing single layer laser-induced damage portraits based on generation of small smoothed etch points of determined sizes and on control of their brightness without variation of their determined sizes. According to the invention the sizes of etch points, which can be used for reproduction of single-layer portraits are determined; shades of gray are reproduced by controlling the number of breakdowns and their special configurations inside transparent area corresponding to the etch point; disposition of these breakdown configurations inside an etch point of determined sizes is actualized by using cumulative effects.
申请公布号 US6426480(B1) 申请公布日期 2002.07.30
申请号 US20000651076 申请日期 2000.08.30
申请人 TROITSKI IGOR 发明人 TROITSKI IGOR
分类号 B23K26/00;B23K26/067;B23K26/12;B44C1/22;B44C5/00;C03C23/00;(IPC1-7):B23K26/00 主分类号 B23K26/00
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