| 摘要 |
PURPOSE: An apparatus for baking a wafer is provided to prevent a process defect caused by a wafer inaccurately placed on a heating plate by making a detecting unit using a sensor and a lift pin detect the wafer placed on the heating plate, and to prevent recurrence of a defect by readjusting a loading position of a robot. CONSTITUTION: A wafer to bake is placed on the heating plate(110). The lift pin loads/unloads the wafer to/from the heating plate, installed in the heating plate. A guide pin guides the wafer loaded to the heating plate, installed at the edge of the heating plate. A wafer detecting unit detects the wafer inaccurately loaded to the heating plate, installed in the guide pin.
|
