发明名称 Heat-dissipating device of a semiconductor device and fabrication method for same
摘要 A heat-dissipating device of a semiconductor device is constituted by: first wiring substrate 1 on which semiconductor elements 7 are mounted; second wiring substrate 2 that supports the back side of first wiring substrate 1, which is the side of this substrate 1 that is opposite the first wiring substrate active surface 4; and heat dissipator 9 that is thermally and mechanically joined to the back surface of semiconductor elements 7, which is the surface of semiconductor elements 7 that is on the opposite side from the surface that confronts first substrate active surface 4. First wiring substrate 1 is electrically joined to second wiring substrate 2 by conductors 6 that extend in the planar direction of first substrate active area 4 from first substrate active surface 4 to electrical junction surface 5 of second wiring substrate 2. Conductors 6 extend linearly in a planar direction that does not bend in the layer direction and are therefore the minimum length. This minimization of length prevents deterioration of the harmonic propagation characteristic.
申请公布号 US2002098622(A1) 申请公布日期 2002.07.25
申请号 US20020050164 申请日期 2002.01.18
申请人 TSUDA TOSHIMASA 发明人 TSUDA TOSHIMASA
分类号 H01L23/34;H01L23/36;H01L23/40;H01L23/66;(IPC1-7):H01L21/44;H01L21/48 主分类号 H01L23/34
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