| 摘要 |
A method for fabricating a liquid crystal display device comprises steps of forming a first metal layer on a substrate and patterning the first metal layer into a plurality of scanning signal lines using a photolithographic treatment; forming a first insulating film and an semiconductor layer consecutively in this order without a photolithographic treatment on the substrate so as to cover the plurality of scanning signal lines thereby, and then forming a second metal layer on the semiconductor layer; patterning the second metal layer into a plurality of data lines and a plurality of electrodes using a photolithographic treatment so that the plurality of data lines extends in a transverse direction to extension directions of the plurality of scanning signal lines and each of the plurality of electrodes confronts one of the data lines on one of the plurality of the scanning signal lines; etching the semiconductor layer using the data lines and the electrodes as a mask; forming a second insulating film on the data lines, the electrodes, and the first insulating film; forming a plurality of openings through the second insulating film at portions thereof located on the respective electrodes using a photolithographic treatment so that each of the plurality of openings exposes one of the electrodes; forming an oxide conductor film on the second insulating film so that the oxide conductor film contacts with each of the electrodes in each of the plurality of openings; and patterning the oxide conductor film into a plurality of pixel electrodes, each of which is connected to one of the electrodes using a photolithographic treatment.
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