| 摘要 |
A lithographic projection apparatus is provided with an optical system (12,14,16,18) built into the wafer table (WT) for producing an image (20A,20B) of a wafer mark (WM1,WM2) that is provided on the back side of the wafer (W). The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back (WM1,WM2) and front (WM3,WM4) of the wafer and a mask can be performed using a pre-existing alignment system <IMAGE> |
