APPARATUS, SYSTEM, AND METHOD FOR DETERMINING A TIME-TEMPERATURE HISTORY OF AN AFTERTREATMENT DEVICE

摘要

An apparatus, system, and method are disclosed for determining a time-temperature history of an aftertreatment device. The apparatus includes an aftertreatment device comprising a substrate, and at least one thermal monitoring member (TMM) in thermal contact with the substrate. The TMMs may comprise a material that exhibits an electrical resistivity change at temperature over time. The apparatus may include a controller configured to measure the electrical resistivity of at least a portion of the TMMs, and to determine a thermal history based on the electrical resistivity measures.