发明名称 Shadow mask structure and color CRT
摘要 In a shadow mask structure, by making the radii of curvature at the center and peripheral parts of a shadow mask different, even if the temperature of the shadow mask structure rises during use in a color CRT, there is extremely small deformation of the shadow mask and small landing error, so that there is no problem with loss of color purity attributed caused thereby.
申请公布号 US6420823(B1) 申请公布日期 2002.07.16
申请号 US20000630807 申请日期 2000.08.02
申请人 NEC CORPORATION 发明人 TANAKA YOSHITO
分类号 H01J29/07;(IPC1-7):H01J29/80 主分类号 H01J29/07
代理机构 代理人
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