JET PLASMA DEPOSITION PROCESS AND APPARATUS

摘要

A process and apparatus (10) for the plasma deposition of a carbon-rich coating onto a substrate (75) is provided. This method includes the steps of providing a substrate (75) in a vacuum chamber, and generating a carbon-rich plasma (160) in the vacuum chamber by injecting a plasma gas into a hollow cathode slot system (40) containing a cathode made of two electrode plates arranged parallel to each other, providing a sufficient voltage to create and maintain a carbon-rich plasma (160) in the hollow cathode slot system (40), and maintaining a vacuum in the vacuum chamber sufficient for maintaining the plasma (160). The plasma is deposited on the substrate to form a carbon-rich coating.