发明名称 Method of fabricating power rectifier device
摘要 A vertical semiconductor rectifier device includes a semiconductor substrate of first conductivity type and having a plurality of gates insulatively formed on a first major surface and a plurality of source/drain regions of the first conductivity type formed in surface regions of second conductivity type in the first major surface adjacent to the gates. A plurality of channels of the second conductivity type each abuts a source/drain region and extends under a gate.
申请公布号 US6420225(B1) 申请公布日期 2002.07.16
申请号 US20010805815 申请日期 2001.03.13
申请人 APD SEMICONDUCTOR, INC. 发明人 CHANG PAUL;RODOV VLADIMIR;CHERN GEENG-CHUAN;LIN CHARLES;CHIANG CHING-LANG
分类号 H01L21/28;H01L21/329;H01L21/336;H01L27/07;H01L27/08;H01L27/095;H01L29/06;H01L29/10;H01L29/78;H01L29/861;(IPC1-7):H01L21/823 主分类号 H01L21/28
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