| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for efficiently recovering indium from a hydrochloric acid solution containing high purity indium generated at the manufacturing or after use of ITO sputtering target. SOLUTION: This method for recovering indium comprises the steps of extraction-treating a hydrochloric acid solution containing indium with an extracting agent of solvating extraction type, reverse extracting this extract by a dilute acid and electrolyzing to form indium.</p> |
