| 摘要 |
PURPOSE: A cluster apparatus having a monitoring system is provided to check periodically states of chambers and a state of a wafer by using one of the chambers as a monitoring chamber. CONSTITUTION: A wafer is inserted into a load lock part(110). The wafer is transferred to a flat alignment part(120) by a transfer robot(130). A flat zone of the wafer is aligned. The wafer is transferred to a degassing part(150) by the transfer robot(130). The wafer is cleaned by using a cleaning solution. The wafer is transferred to a proper chamber by a program inputted into a main computer of a cluster(100). The wafer is transferred to a cool-down part(140). A cooling process is performed to lower temperature of the wafer. A test for the wafer is performed by using a particle detection part(170) and a shift resist measuring part(180). The measured data are processed by a main computer.
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