| 发明名称 |
METHOD OF PRODUCING DEVICE AND PHOTOMASK APPLIED TO THE METHOD AND METHOD MANUFACTURING THE PHOTOMASK |
| 摘要 |
<p>PROBLEM TO BE SOLVED: To improve breakage rate of a device or a photomask itself during a manufacturing process by preventing a resist from contacting with other devices or the like and reducing generation of foreign matters. SOLUTION: The device is produced by using a resist pattern-attached photomask having a contact part contacting with other devices or the like, and the contact part is such that resin is not applied.</p> |
| 申请公布号 |
JP2002196469(A) |
申请公布日期 |
2002.07.12 |
| 申请号 |
JP20000393232 |
申请日期 |
2000.12.25 |
| 申请人 |
HITACHI LTD |
发明人 |
HASEGAWA NORIO;TANAKA TOSHIHIKO;TERASAWA TSUNEO |
| 分类号 |
G03F1/32;G03F1/54;G03F1/56;G03F1/60;G03F1/68;G03F7/16;G03F7/20;H01L21/027;(IPC1-7):G03F1/08;G03F1/14 |
主分类号 |
G03F1/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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