| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing method which can drastically improve a reaction rate of a substrate surface treatment by a treated solution, and its apparatus. SOLUTION: In the substrate processing apparatus of this invention having a processor which processes the surface treatment of a substrate W reacting a treated solution (e.g. ozone water), in which a gas (e.g. ozone) is dissolved, to the substrate W, the processor comprises a substrate temperature up unit 5 raising the substrate temperature to a predetermined higher temperature than that of the ozone water, and a processing tank 1 which processes the surface treatment of the substrate W reacting the ozone water to the substrate W of which the temperature is raised by the substrate temperature up unit 5.
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