发明名称 APPARATUS AND METHOD OF WAFER ALIGNMENT
摘要 <p>PROBLEM TO BE SOLVED: To provide an apparatus and method of a wafer alignment capable of detecting crystal orientation of a semiconductor wafer without forming any orientation flat nor V-notch and accurately aligning even for elliptic wafer. SOLUTION: A wafer alignment apparatus picks up an image of a wafer W by detecting with a detecting means crystal orientation lines 25 for showing a crystal orientation of a wafer formed by grooves with dicing in a region of the wafer W without its circuit formed in addition to dicing lines 23 for zoning a chip, and recognize, the crystal orientation line 25 by processing the taken image.</p>
申请公布号 JP2002198415(A) 申请公布日期 2002.07.12
申请号 JP20000397951 申请日期 2000.12.27
申请人 LINTEC CORP;TOSHIBA CORP 发明人 KUROKAWA HIDEJI;NUMATA HIDEO
分类号 H01L21/68;H01L21/301;(IPC1-7):H01L21/68 主分类号 H01L21/68
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