发明名称 |
APPARATUS AND METHOD OF WAFER ALIGNMENT |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an apparatus and method of a wafer alignment capable of detecting crystal orientation of a semiconductor wafer without forming any orientation flat nor V-notch and accurately aligning even for elliptic wafer. SOLUTION: A wafer alignment apparatus picks up an image of a wafer W by detecting with a detecting means crystal orientation lines 25 for showing a crystal orientation of a wafer formed by grooves with dicing in a region of the wafer W without its circuit formed in addition to dicing lines 23 for zoning a chip, and recognize, the crystal orientation line 25 by processing the taken image.</p> |
申请公布号 |
JP2002198415(A) |
申请公布日期 |
2002.07.12 |
申请号 |
JP20000397951 |
申请日期 |
2000.12.27 |
申请人 |
LINTEC CORP;TOSHIBA CORP |
发明人 |
KUROKAWA HIDEJI;NUMATA HIDEO |
分类号 |
H01L21/68;H01L21/301;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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